Based in Munich, Germany, with offices in Tokyo Japan and San Francisco California, GenISys develops, markets and supports flexible, high-performance software solutions for the optimization of micro- and nano fabrication processes. Addressing the market for lithography and inspection, GenISys combines deep technical expertise in layout data processing, process modeling, correction and optimization with world class software engineering and a strong focus on ease of use for applications in IC prototyping, mask production, DfM development and MEMS. For e-beam direct write and mask manufacturing, our data preparation and proximity effect correction software helps to push the limits of e-Beam technology. Since its foundation in 2005, GenISys has become a global market leader in the field of e-beam lithography software and is expanding to related markets and applications.
As a company focused on customer service, GenISys delivers fast, highly dedicated support for application and development of needed functionality to meet demanding customer needs. At GenISys you will find challenge, variety, and a chance to apply your individual talents to some of the most complex problems in the world.