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Publications

Benchmark of Monte Carlo Simulation for high Resolution Electron Beam Lithography

Karl E. Hoffmann, Marcus Rommel, Thomas Reindl, Jürgen Weis, Nezih Unal, Ulrich Hofmann
International Conference on Micro and Nano Engineering (MNE), Berlin, 2011

 

http://www.sciencedirect.com/science/article/pii/S0167931712003140