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Publications

Easy to adapt electron beam lithography PEC calibration based on visual inspection of a "Best Dose Sensor"

Nezih Unal, Martin D.B. Charlton, Ulrike Waizmann, Thomas Reindl, Ulrich Hofmann
International Conference on Micro and Nano Engineering (MNE) 2009

Abstract under:  http://www.mne2010.org/webservices/abstract/pdf/mne2010-647.pdf

Articel under :     http://www.sciencedirect.com/science/article/pii/S0167931711001936