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Publications

3D Topography Mask Aligner Lithography Simulation

Ulrich Hofmann, Nezih Ünal, GenISys GmbH, Germany
Ralph Zoberbier, SUSS MicroTec Lithography, Germany
Ton Nellissen, Philips Research, Netherlands

Published in "SUSS Report 01/2013"

 Push button below for download of SUSS Report 01/2013 - see page 20 till 23

http://www.suss.com/fileadmin/user_upload/suss_report/SUSSreport_V1_2013_web.pdf