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Publications

Simulation for Advanced Mask Aligner Lithography

Ulrich Hofmann, Daniel Ritter, Balint Meliorisz, Nezih Ünal, GenISys GmbH
Michael Hornung, Ralph Zoberbier, SUSS MicroTec Lithography
Published in "SUSS Report 01/2012"

 Push button below for download of SUSS Report 01/2012 - see page 8 till 11
http://www.suss.com/fileadmin/user_upload/suss_report/SUSS_Report_01_2012_Original_2248.pdf