BEAMER Webinar Series - China / BEAMER中国网络研讨会系列
We are pleased to announce our next Webinar Series for the China region we'll be hosting throughout the fall.
|Session||Subject||Date and Time
China Standard Time
|1||BEAMER Introduction & Functionality Overview||October 20, 2021 at 15:00 – 16:00|
|2||Proximity Effect Correction Introduction||November 17, 2021 at 15:00 – 16:00|
|3||BEAMER Layout Operation||December 8, 2021 at 15:00 – 16:00|
Proximity- and process effects and their correction are key technology for advanced e-beam lithography. BEAMER and TRACER are offering the comprehensive tools for a broad range of application. This webinar series is the perfect starting point for new users and a good opportunity to extend the BEAMER knowledge for existing users, where each session will be hosted by the GenISys experts in local Chinese language and are open for question and discussion.
REGISTRATION / 研讨会注册
REGISTER HERE - 请点击此处注册
You are very welcome to pass on this information to your colleagues or e-beam lithography users and interested students. The webinar series will be a great opportunity to learn from the basics to very specific solution of e-beam lithography.
More webinars will follow, so please follow us on LinkedIn.