Photomask Japan 2026

Photomask Japan 2026 is the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends.

   Time: April 8 - 10, 2026
   Place: Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan

GenISys will be exhibiting at this event. The GenISys Asia team will be present at our booth throughout the exhibition (booth number to be announced).

For more information on the conference please visit the PMJ website:
Photomask Japan 2026 | HOME

We look forward to welcoming you at PMJ 2026!

If you have any questions please feel free to contact us: marketing@genisys-gmbh.com

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