EIPBN BEAMeeting 2025
The EIPBN 2025 GenISys BEAMeeting took place on Tuesday, May 27th, at the Hyatt Regency in the charming historic district of Savannah. The event was a great success both on-site and online, with around 70 attendees joining in person and many more participating remotely.
Uli Hofmann, General Manager, as well as Product Managers Thomas Michels and Sven Bauerdick joined the event from our headquarters, together with our US regional team. They presented the latest updates on GenISys and our products, along with insightful application solutions.
We were especially honored to feature presentations from our users at Lawrence Livermore National Laboratory, Penn State University, Stanford University, Georgia Institute of Technology, HRL Laboratories, and the University of Michigan. They shared valuable experiences and application cases, contributing to a BEAMeeting filled with detailed technical exchange and engaging discussions.
We extend our sincere thanks to all guest speakers and everyone who participated - your contributions made this event a true success!
Below are the BEAMeeting presentations and recorded videos.
BEAMeeting Presentations
GenISys Intro
GenISys Product Intro
Micro-Nanofabricated Implantable Neural Interfaces
Navigating Topography Challenges in Advanced e-beam Lithograhpy for Implantable Devices
InSPEC Process Calibration with Pattern Specific Correctdions
InSPEC Update and Roadmap
Metrology for Gap Optimization in E-beam Lithography
LER Improvement and Analysis
Advanced Write Order Control Strategies
Using BeamerPy and Python Tools Automate Fracturing and Job Generation Process Flows
Optimizing E-Beam Lithography for 15mm Diameter Metalens Using BEAMER
A Simulation-Guided Approach to E-Beam Data Preparation and Correction
What's New ProSEM
What's New in BEAMER
BEAMeeting Videos
GenISys Intro
GenISys Product Intro
Micro-Nanofabricated Implantable Neural Interfaces
Navigating Topography Challenges in Advanced e-beam Lithograhpy for Implantable Devices
InSPEC Process Calibration with Pattern Specific Correctdions
InSPEC Update and Roadmap
Metrology for Gap Optimization in E-beam Lithography
LER Improvement and Analysis
Advanced Write Order Control Strategies
Using BeamerPy and Python Tools Automate Fracturing and Job Generation Process Flows
Optimizing E-Beam Lithography for 15mm Diameter Metalens Using BEAMER
A Simulation-Guided Approach to E-Beam Data Preparation and Correction
What's New ProSEM
What's New in BEAMER
