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GenISys GmbH
Skip navigation
  • Products
    • BEAMER
    • TRACER
    • LAB
    • ProSEM
    • MASKER
  • Applications
    • Advanced exposure technique
    • Fracture Optimization
    • Flexibility
    • LAB supports SUSS optics
    • LAB enables OPC
    • Multipass Exposure
    • 3D PEC
    • Base Dose Factor
    • Laser Grayscale Lithography
    • PEC for Exposure on Thin Membranes
    • Mixed Exposure Strategies
    • Shape PEC
    • Projection Simulation Quick Guide
    • PEC: Data Volume and Throughput
    • Pattern Replacement for Post Processing
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar - E-Beam Lithography Simulation
    • Webinar Series: BEAMER Training
  • Corporate
    • News
    • GenISys Profile
    • GenISys History
    • Career Opportunities
  • Login
  • Contact

Applications

Advanced exposure technique

Fracture Optimization

Flexibility

LAB supports SUSS optics

LAB enables OPC

3D PEC

Base Dose Factor

Laser Grayscale Lithography

PEC for Exposure on Thin Membranes

Mixed Exposure Strategies

Shape PEC

Projection Simulation Quick Guide

PEC: Data Volume and Throughput

Pattern Replacement for Post Processing

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