Superior data preparation for electron- and laser-beam lithography exposure
BEAMER is the most comprehensive lithography software for optimized electron- and laser-beam exposure.
Electron Scattering and Process Effects Quantified
TRACER is a Monte Carlo simulator that computes the electron-solid interaction of any arbitrary material stack and performs advanced process calibration for electron beam proximity effect correction.
Layout and process optimization platform for most common lithography technologies
LAB enable next generation products and faster development by computational design and process optimization.
Automated Feature Measurements from SEM Images
ProSEM analyzes your SEM image files, giving you fast, consistent feature measurements for your process calibration and monitoring tasks.
Mask Data Preparation (MDP) and Mask Process Correction (MPC) addressing the needs of non-standard masks
Optimal mask productivity and quality for flat panel display (FPD), photonics, IoT and special devices.
