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    • BEAMER
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  • Applications
    • Bulk & sleeving of patterns for time writing optimisation
    • Fracturing of periodic layouts for photonic crystals
    • Designing Fresnel zone plates using formulas in BEAMER
    • SÜSS-MicroOptics Source Mask Optimisation
    • LAB simulation methods and Optical Proximity Correction in Lithography
    • Multipass Techniques
    • 3D E-beam lithography
    • Using TRACER to Estimate the Base-Dose for Different Substrates
    • Filling arbitrary shapes with tilted gratings
    • Laser Grayscale Lithography
    • Dose Assignments for Exposures on Thin Membranes
    • Exposure Strategies for Optimised Writing
    • Influence of Shape PEC on Resist Profile
    • Projection Simulation Example
    • Managing PEC Data Volume to Improve Throughput
    • Pattern replacement and filtering for post processing
    • Optimisation of relative dose exposure for critical features
    • Loops, Variables and Functions
    • Using Loop module in BEAMER
    • Exposure dose for targets and large areas
    • 3D Correction for Dolan Technique
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar Series: BEAMER Training
    • Webinar: LAB Simulation of Proximity Lithography
    • Webinar: LAB Simulation of Projection Lithography
    • Webinar: LAB Simulation of Laser Lithography
    • Webinar: LAB Simulation of E-BEAM Lithography
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    • TRACER Download
    • LAB Download
    • VIEWER Download
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GenISys GmbH
Skip navigation
  • Products
    • BEAMER
    • LAB
    • TRACER
    • MASKER
    • ProSEM
    • InSPEC
  • Applications
    • Bulk & sleeving of patterns for time writing optimisation
    • Fracturing of periodic layouts for photonic crystals
    • Designing Fresnel zone plates using formulas in BEAMER
    • SÜSS-MicroOptics Source Mask Optimisation
    • LAB simulation methods and Optical Proximity Correction in Lithography
    • Multipass Techniques
    • 3D E-beam lithography
    • Using TRACER to Estimate the Base-Dose for Different Substrates
    • Filling arbitrary shapes with tilted gratings
    • Laser Grayscale Lithography
    • Dose Assignments for Exposures on Thin Membranes
    • Exposure Strategies for Optimised Writing
    • Influence of Shape PEC on Resist Profile
    • Projection Simulation Example
    • Managing PEC Data Volume to Improve Throughput
    • Pattern replacement and filtering for post processing
    • Optimisation of relative dose exposure for critical features
    • Loops, Variables and Functions
    • Using Loop module in BEAMER
    • Exposure dose for targets and large areas
    • 3D Correction for Dolan Technique
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar Series: BEAMER Training
    • Webinar: LAB Simulation of Proximity Lithography
    • Webinar: LAB Simulation of Projection Lithography
    • Webinar: LAB Simulation of Laser Lithography
    • Webinar: LAB Simulation of E-BEAM Lithography
  • Download
    • BEAMER Download
    • TRACER Download
    • LAB Download
    • VIEWER Download
  • Corporate
    • News & Events
    • GenISys Profile
    • GenISys History
    • Career Opportunities
  • Login
  • Contact

Products

Superior data preparation for electron- and laser-beam lithography exposure

BEAMER is the most comprehensive lithography software for optimized electron- and laser-beam exposure.

Layout and process optimization platform for most common lithography technologies

LAB enable next generation products and faster development by computational design and process optimization.

Electron Scattering and Process Effects Quantified

TRACER is a Monte Carlo simulator that computes the electron-solid interaction of any arbitrary material stack and performs advanced process calibration for electron beam proximity effect correction.

Mask Data Preparation (MDP) and Mask Process Correction (MPC) addressing the needs of non-standard masks

Optimal mask productivity and quality for flat panel display (FPD), photonics, IoT and special devices.

Advanced SEM Image Analysis, Metrology & Automation Software Package

ProSEM easily provides consistent feature measurements for your process calibration and monitoring tasks. With optional digital interfaces it can connect to your SEM for automated image acquisition.

Integrated SEM Metrology & Inspection Software Suite and Upgrade Kit

InSPEC provides advanced multi-chip metrology jobs with integrated scanning, contour detection, corrections, and data processing.

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